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Volumn 6151 II, Issue , 2006, Pages
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Three-dimensional rigorous simulation of EUV defective masks using modal method by fourier expansion
a a a
a
CEA GRENOBLE
(France)
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Author keywords
3D electromagnetic simulation; Absorber pattern; Aerial image; Defective mask; EUV lithography; Modal method
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Indexed keywords
COMPUTER SIMULATION;
ELECTROMAGNETIC FIELD EFFECTS;
MODAL ANALYSIS;
PHOTOLITHOGRAPHY;
THREE DIMENSIONAL;
ULTRAVIOLET RADIATION;
3D ELECTROMAGNETIC SIMULATION;
ABSORBER PATTERN;
AERIAL IMAGE;
EUV LITHOGRAPHY;
MODAL METHOD;
MASKS;
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EID: 33745625613
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.655495 Document Type: Conference Paper |
Times cited : (12)
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References (14)
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