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Volumn 6151 II, Issue , 2006, Pages

Three-dimensional rigorous simulation of EUV defective masks using modal method by fourier expansion

Author keywords

3D electromagnetic simulation; Absorber pattern; Aerial image; Defective mask; EUV lithography; Modal method

Indexed keywords

COMPUTER SIMULATION; ELECTROMAGNETIC FIELD EFFECTS; MODAL ANALYSIS; PHOTOLITHOGRAPHY; THREE DIMENSIONAL; ULTRAVIOLET RADIATION;

EID: 33745625613     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.655495     Document Type: Conference Paper
Times cited : (12)

References (14)
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    • Li, L.1
  • 14
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.