SCOPUS 정보 검색 플랫폼

Volumn 87, Issue 2, 2005, Pages

Highly sensitive detection technique of buried defects in extreme ultraviolet masks using at-wavelength scanning dark-field microscopy

Author keywords

[No Author keywords available]

Indexed keywords

SENSITIVE DETECTION; SILICON OXIDE; ULTRAVIOLET MASKS;

DEFECTS; IMAGE ANALYSIS; MICROSCOPIC EXAMINATION; MOLYBDENUM; SCANNING; SILICON COMPOUNDS;

MASKS;

EID: 24144480049 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.1984097 Document Type: Article

Times cited : (7)

References (12)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.