Resist profile control in immersion lithography using scatterometry measurements

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 1, 2005, Pages 129-140

  Pollentier, I ^a   Ercken, M ^a   Foubert, P ^a   Cheng, S Y ^a  

^a IMEC   (Belgium)

Author keywords

CD control; Chemical interaction; Immersion lithography; Photoresist; Scatterometry; Soak; Topcoat

Indexed keywords

COMPUTER SIMULATION; DIFFUSION; LEACHING; PHOTORESISTS; SCANNING; SCATTERING;

CD-CONTROL; CHEMICAL INTERACTION; IMMERSION LITHOGRAPHY; SOAK; TOPCOAT;

PHOTOLITHOGRAPHY;

EID: 22144471849     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599745     Document Type: Conference Paper

References (6)

1. Bruce Smith, Hoyoung Kang, Anatoly Bourov, Frank Cropanese, Yongfa Fan, "Water immersion optical lithography for the 45nm node", Proc. SPIE, Vol. 5040, p. 679-689, 2003
2. Shinji Kishimura, Roel Gronheid, Monique Ercken, Mireille Maenhoudt, "Impact of Water and Top-coats on Lithographic Performance in 193-nm Immersion Lithography", Proc. SPIE, Vol. 5753, 2005
3. Xinhui Niu, Nickhil Jakatdar, Junwei Bo and Costas Spnos, "Specular Spectroscopic Scatterometry", IEEE Transactions on Semiconductor Manufacturing, Vol. 14, No. 2, May 2001.
4. Philippe J. Leray, Shaunee Cheng, Stephanie Kremer, Monique Ercken, and Ivan Pollentier, "Optimization of scatterometry parameters for shallow trench isolation (STI) monitor", Proc. SPIE, Vol. 5375, pp. 576-586, 2004
5. Kelly Barry, Shaunee Cheng, Greet Storms, and Bart Baudemprez, "Integrated Scatterometry for Contact Hole Monitoring", Proc. Arch Interface, 2004
6. Ivan Pollentier, Shaunee Y. Cheng, Bart Baudemprez, David Laidler, Youri van Dommelen, Rene Carpaij, Jackie Yu, Junichi Uchida, Anita Viswanathan, Doris Chin, Kelly Barry, Nickhil Jakatdar, "In-line lithography cluster monitoring and control using integrated scatterometry", Proc. SPIE, Vol. 5378, p. 105-115, 2004