TSI process performance in a transformer-coupled plasma dry develop tool

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2724, Issue , 1996, Pages 399-409

  Hutchinson, John M ^a   Melaku, Yosias ^a   Nguyen, Wendy ^a   Das, Siddhartha ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODES; ETCHING; INTERFEROMETERS; OXYGEN; PERFORMANCE; PHOTOLITHOGRAPHY; PLASMA DEVICES; PROCESS CONTROL; THERMAL EFFECTS;

SILYLATION; TSI PROCESS;

PHOTORESISTS;

EID: 0029774842     PISSN: None     EISSN: None     Source Type: None    
DOI: 10.1117/12.241838     Document Type: Conference Paper

References (11)