Thin-film imaging: Past, present, prognosis

IBM Journal of Research and Development

Volumn 41, Issue 1-2, 1997, Pages 105-117

  Seeger, D E ^a,b,c,d   La Tulipe Jr , D C ^e   Kunz, R R ^e   Garza, C M ^e   Hanratty, M A ^e  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b IBM   (United States)

^c YALE UNIVERSITY   (United States)

^d IEEE   (United States)

^e NONE

Author keywords

[No Author keywords available]

Indexed keywords

IMAGING TECHNIQUES; MASKS; PLASMA ETCHING; SEMICONDUCTOR DEVICE MANUFACTURE; THIN FILMS;

THIN FILM IMAGING (TFI); TOP SURFACE IMAGING (TSI);

PHOTORESISTS;

EID: 0030653562     PISSN: 00188646     EISSN: None     Source Type: Journal    
DOI: 10.1147/rd.411.0105     Document Type: Article

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