Dry development of sub-0.25 μm features patterned with 193 nm silylation resist

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 3, 1996, Pages 1132-1136

  Palmateer, S C ^a   Forte, A R ^a   Kunz, R R ^a   Horn, M W ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001633117     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580282     Document Type: Article

References (19)

1. T. M. Wolf, G. N. Taylor, T. Venkatesan, and R. T. Kraetsch, J. Electrochem. Soc. 131, 1664 (1994).
2. J. Asmussen, J. Vac. Sci. Technol. A 7, 883 (1989).
3. G. Fortuno-Wiltshire, J. Vac. Sci. Technol. A 9, 2356 (1991).
4. C. H. Chen, M. S. Chang, and C. L. Yang, in Proceedings of the 8th Symposium on Plasma Processing (The Electrochemical Society, Pennington, NJ, 1990), p. 368.
5. M. Yamada, T. Ebata, and J. Yamada, J. Vac. Sci. Technol. A 9, 347 (1991).
6. K. H. Kretschmer, K. Matl, G. Lorenz, I. Kessler, and B. Dumbacher, Solid State Technol. 53, February (1990).
7. K. Skidmore, Semiconduct. Int. 74, June (1989).
8. D. L. Flamm and V. M. Donnelly, Plasma Chem. Plasma Proc. 1, 317 (1981).
9. S. Tachi, K. Tsujimoto, S. Arai, and T. Kure, J. Vac. Sci. Technol. A 9, 796 (1991).
10. T. Kure, H. Kawakami, S. Tachi, and H. Enami, Jpn. J. Appl. Phys. 30, 1562 (1991).
11. S. Kadomura and J. Satoh, Extended Abstracts of the 22nd Conference on Solid State Devices and Materials (Business Center for the Academic Society of Japan, Tokyo, 1990), pp. 203-206.
12. J. Etrillant, J. M. Francou, A. Inard, and D. Henry, Jpn. J. Appl. Phys. 33, 6005 (1994).
13. N. Benjamin, B. Chapman, and R. Boswell, Proc. SPIE 1392, 95 (1990).
14. C. W. Jurgensen, R. S. Hutton, and G. N. Taylor, J. Vac. Sci. Technol. B 10, 2542 (1992).
15. Low Entropy Systems, Inc., 83A Monroe Street, Somerville, MA 02143.
16. M. A. Hartney, M. Rothschild, R. R. Kunz, D. J. Ehrlich, and D. C. Shaver, J. Vac. Sci. Technol. B 8, 1476 (1990).
17. Genesis, 3066 Scott Boulevard, Santa Clara, CA 95054.
18. R. R. Kunz, M. A. Hartney, R. W. Otten, Jr., E. Barouch, and U. Hollerbach, Proc. SPIE 1927, 464 (1993).
19. S. C. Palmateer, R. R. Kunz, M. W. Horn, A. R. Forte, and M. Rothschild, Proc. SPIE 2438, 455 (1995).