Comparison of advanced plasma sources for etching applications. V. Polysilicon etching rate, uniformity, profile control, and bulk plasma properties in a helical resonator plasma source

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 4, 1996, Pages 2510-2518

  Lee, J T C ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0009983214     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588761     Document Type: Article

References (14)

1. P. H. Singer, Semicond. Int. 5, 50 (1993).
2. M. A. Lieberman and R. A. Gottscho, Physics of Thin Films: Advances in Research and Development, edited by J. Vossen (Academic, New York, 1993).
3. S. M. Gorbatkin, L. A. Berry, and J. Swyers, J. Vac. Sci. Technol. A 10, 1295 (1992).
4. D. X. Ma, T. A. Lin, and C. H. Chen, J. Vac. Sci. Technol. A 10, 1217 (1992).
5. P. K. Gadgil, D. Dane, and T. D. Mantei, J. Vac. Sci. Technol. A 10, 1303 (1992).
6. P. Mak, G. King, T. A. Grotjohn, and J. Asmussen, J. Vac. Sci. Technol. A 10, 1281 (1992).
7. A. J. Perry, D. Vender, and R. W. Boswell, J. Vac. Sci. Technol. B 9, 310 (1991).
8. D. E. Ibbotson, J. M. Cook, and C. P. Chang, in Proceedings of the 12th Symposium on Dry Process (IEE, Tokyo, 1990), p. 93.
9. I. Tepermeister, N. Blayo, F. P. Klemens, D. E. Ibbotson, R. A. Gottscho, J. T. C. Lee, and H. H. Sawin, J. Vac. Sci. Technol. B 12, 2310 (1994).
10. I. Tepermeister, D. E. Ibbotson, J. T. C. Lee, and H. H. Sawin, J. Vac. Sci. Technol. B 12, 2322 (1994).
11. G. W. Gibson, H. H. Sawin, I. Tepermeister, D. E. Ibbotson, and J. T. C. Lee, J. Vac. Sci. Technol. B 12, 2333 (1994).
12. N. Blayo et al., J. Vac. Sci. Technol. B 12, 1340 (1994).
13. T. J. Dalton, W. T. Conner, and H. H. Sawin, J. Electrochem. Soc. 141, 1893 (1994).
14. N. Layadi, V. M. Donnelly, and J. T. C. Lee (unpublished).