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Volumn 42, Issue 13, 2006, Pages 779-780

Small-signal characteristics of AlInN/GaN HEMTs

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; ELECTRON MOBILITY; ELECTRON TRANSPORT PROPERTIES; GALLIUM NITRIDE; OSCILLATIONS; PASSIVATION;

EID: 33745464517     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:20060768     Document Type: Article
Times cited : (46)

References (9)
  • 1
    • 0001473741 scopus 로고    scopus 로고
    • AlGaN-GaN HEMTs - An overview of device operation and application
    • Mishra, U.K.: et al. ' AlGaN-GaN HEMTs - an overview of device operation and application ', Proc. IEEE, 2002, 90, (12), p. 1022-1031
    • (2002) Proc. IEEE , vol.90 , Issue.12 , pp. 1022-1031
    • Mishra, U.K.1
  • 2
    • 1642359162 scopus 로고    scopus 로고
    • 30-W/mm GaN HEMTs by field plate optimization
    • Wu, Y.-F.: et al. ' 30-W/mm GaN HEMTs by field plate optimization ', IEEE Electron Device Lett., 2004, 25, p. 117
    • (2004) IEEE Electron Device Lett. , vol.25 , pp. 117
    • Wu, Y.-F.1
  • 3
    • 0035506756 scopus 로고    scopus 로고
    • Power electronics on InAlN/(In)GaN: Prospect for a record performance
    • Kuzmik, J.: ' Power electronics on InAlN/(In)GaN: prospect for a record performance ', IEEE Electron Device Lett., 2001, 22, p. 510
    • (2001) IEEE Electron Device Lett. , vol.22 , pp. 510
    • Kuzmik, J.1
  • 4
    • 0036610915 scopus 로고    scopus 로고
    • InAlN/(In)GaN high electron mobility transistors: Some aspects of the quantum well heterostructure proposal
    • Kuzmik, J.: ' InAlN/(In)GaN high electron mobility transistors: some aspects of the quantum well heterostructure proposal ', Semicond. Sci. Technol., 2002, 17, p. 540
    • (2002) Semicond. Sci. Technol. , vol.17 , pp. 540
    • Kuzmik, J.1
  • 5
    • 4243188128 scopus 로고    scopus 로고
    • InAlN/GaN heterostructure field-effect transistors grown by plasma-assisted molecular-beam epitaxy
    • Higashiwaki, M.: et al. ' InAlN/GaN heterostructure field-effect transistors grown by plasma-assisted molecular-beam epitaxy ', Jpn. J. Appl. Phys., 2004, 43, (6B), p. L768
    • (2004) Jpn. J. Appl. Phys. , vol.43 , Issue.6 B , pp. 768
    • Higashiwaki, M.1
  • 6
    • 11044229352 scopus 로고    scopus 로고
    • High sheet charge carrier density AlInN/GaN field-effect transistors on Si (111)
    • Dadgar, A.: et al. ' High sheet charge carrier density AlInN/GaN field-effect transistors on Si (111) ', Appl. Phys. Lett., 2004, 85, p. 5400
    • (2004) Appl. Phys. Lett. , vol.85 , pp. 5400
    • Dadgar, A.1
  • 7
    • 6444240783 scopus 로고    scopus 로고
    • InAlN/GaN heterostructure field-effect transistor DC and small-signal characteristics
    • Katz, O.: et al. ' InAlN/GaN heterostructure field-effect transistor DC and small-signal characteristics ', Electron. Lett., 2004, 40, (20), p. 1304
    • (2004) Electron. Lett. , vol.40 , Issue.20 , pp. 1304
    • Katz, O.1
  • 8
  • 9
    • 0041511972 scopus 로고    scopus 로고
    • High-quality AlInN for high index contrast Bragg mirrors lattice matched to GaN
    • Carlin, J.-F.: et al. ' High-quality AlInN for high index contrast Bragg mirrors lattice matched to GaN ', Appl. Phys. Lett., 2003, 83, p. 668
    • (2003) Appl. Phys. Lett. , vol.83 , pp. 668
    • Carlin, J.-F.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.