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Volumn 352, Issue 9-20 SPEC. ISS., 2006, Pages 1704-1707
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Fabrication of amorphous silicon thin-film transistor by micro imprint lithography
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Author keywords
Amorphous semiconductors; Spin coating; Thin film transistors
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Indexed keywords
ELECTRON MOBILITY;
LITHOGRAPHY;
ORGANIC POLYMERS;
REACTIVE ION ETCHING;
THIN FILM TRANSISTORS;
THRESHOLD VOLTAGE;
AMORPHOUS FLUOROPOLYMER;
AMORPHOUS SEMICONDUCTORS;
FIELD-EFFECT MOBILITY;
MICRO IMPRINT LITHOGRAPHY;
AMORPHOUS SILICON;
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EID: 33745456934
PISSN: 00223093
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jnoncrysol.2005.10.065 Document Type: Article |
Times cited : (15)
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References (14)
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