Reaction mechanism of silicon Cat-CVD

Journal of Non-Crystalline Solids

Volumn 352, Issue 9-20 SPEC. ISS., 2006, Pages 919-924

  Nakamura, S ^a   Matsumoto, K ^a   Susa, A ^a   Koshi, M ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

Chemical vapor deposition

Indexed keywords

ADSORPTION; CHEMICAL VAPOR DEPOSITION; CONCENTRATION (PROCESS); CORRELATION METHODS; FILM GROWTH; HYDROGEN; REACTION KINETICS; SILANES;

FILM QUALITY; KINETIC SIMULATIONS; PRECURSORS; QUANTUM CHEMICAL CALCULATIONS;

SILICON;

EID: 33745431743     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2005.11.136     Document Type: Article

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