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Volumn 33, Issue 2, 2001, Pages 136-141

Kinetics of Si2H2 produced by the 193 nm photolysis of disilane

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE COMPOUNDS; EXCIMER LASERS; MASS SPECTROMETRY; NITROGEN OXIDES; OXYGEN; PHOTOIONIZATION; PHOTOLYSIS; RATE CONSTANTS;

EID: 0035252520     PISSN: 05388066     EISSN: None     Source Type: Journal    
DOI: 10.1002/1097-4601(200102)33:2<136::AID-KIN1006>3.0.CO;2-H     Document Type: Article
Times cited : (10)

References (25)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.