Formation process of Β-FeSi 2/Si heterostructure in high-dose Fe ion implanted Si

Journal of Applied Physics

Volumn 99, Issue 11, 2006, Pages

  Ishimaru, Manabu ^a   Omae, Keisuke ^a   Bae, In Tae ^a   Naito, Muneyuki ^a   Hirotsu, Yoshihiko ^a   Valdez, James A ^b   Sickafus, Kurt E ^b  

^a OSAKA UNIVERSITY   (Japan)

^b LOS ALAMOS NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING TEMPERATURE; IMPLANTATION-INDUCED MICROSTRUCTURES; STRUCTURAL EVOLUTION;

ION IMPLANTATION; IRON COMPOUNDS; SEMICONDUCTING SILICON; SYNTHESIS (CHEMICAL); TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

HETEROJUNCTIONS;

EID: 33745299259     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2201729     Document Type: Article

References (36)

1. Y. Makita, AIP Conf. Proc. 404, 3 (1997).
2. Binary Alloy Phase Diagrams, 2nd ed., edited by, T. B. Massalski, H. Okamoto, P. R. Subramanian, and, L. Kacprazak, (ASM International, Ohio, 1990).
3. C. N. McKinty, K. J. Kirkby, K. P. Homewood, S. P. Edwards, G. Shao, R. Valizadeh, and J. S. Colligon, Nucl. Instrum. Methods Phys. Res. B 188, 179 (2002).
4. K. Uemura and I. Nishida, Thermoelectric Semiconductors and Their Applications (Nikkan-Kogyo, Tokyo, 1998).
5. M. Ito, H. Nagai, E. Oda, S. Katsuyama, and K. Majima, J. Appl. Phys. 91, 2138 (2002).
6. H. Katsumata, J. Appl. Phys. 80, 5955 (1996).
7. T. Suemasu, Y. Iikura, T. Fujii, K. Takakura, N. Hiroi, and F. Hasegawa, Jpn. J. Appl. Phys., Part 2 38, L620 (1999).
8. C. Spinella, S. Coffa, C. Bongiorno, S. Pannitteri, and M. G. Grimaldi, Appl. Phys. Lett. 76, 173 (2000).
9. L. Martinelli, Phys. Rev. B 66, 085320 (2002).
10. L. Martinelli, E. Grilli, M. Guzzi, and M. G. Grimaldi, Appl. Phys. Lett. 83, 794 (2003).
11. D. Leong, M. Harry, K. J. Reeson, and K. P. Homewood, Nature (London) 387, 686 (1997).
12. T. Suemasu, Y. Negishi, K. Takahara, and F. Hasegawa, Jpn. J. Appl. Phys., Part 2 39, L1013 (2000).
13. S. Mantl, Mater. Sci. Rep. 8, 1 (1992).
14. K. Izumi, H. Doken, and H. Ariyoshi, Electron. Lett. 14, 593 (1978).
15. B. Schuller, R. Carius, and S. Mantl, J. Appl. Phys. 94, 207 (2003).
16. Y. Gao, S. P. Wong, W. Y. Cheung, G. Shao, and K. P. Homewood, Appl. Phys. Lett. 83, 42 (2003).
17. K. Radermacher, S. Mantl, Ch. Dieker, and H. Lüth, Appl. Phys. Lett. 59, 2145 (1991).
18. D. J. Oostra, C. W. T. Bulle-Lieuwma, D. E. W. Vandenhoudt, F. Felten, and J. C. Jans, J. Appl. Phys. 74, 4347 (1993).
19. Z. Yang and K. P. Homewood, J. Appl. Phys. 79, 4312 (1996).
20. M. Sugiyama and Y. Maeda, Thin Solid Films 381, 225 (2001).
21. J. F. Ziegler, J. P. Biersack, and U. Littmark, The Stopping and Range of Ions in Solids (Pergamon, New York, 1985).
22. Z. Tan, F. Namavar, J. I. Budnick, F. H. Sanchez, A. Fasihuddin, S. M. Heald, C. E. Bouldin, and J. C. Woicik, Phys. Rev. B 46, 4077 (1992).
23. X. Li, D. Nie, and C. Dong, Nucl. Instrum. Methods Phys. Res. B 194, 47 (2002).
24. G. G. Gumarov, V. Yu. Petukhov, V. A. Shustov, and I. B. Khaibullin, Nucl. Instrum. Methods Phys. Res. B 127/128, 321 (1997).
25. G. J. Dienes and A. C. Damask, J. Appl. Phys. 29, 1713 (1958).
26. M. Nastasi, J. W. Mayer, and J. K. Hirvonen, Ion-Solid Interactions: Fundamental and Applications (Cambridge University Press, Cambridge, 1996).
27. M. Naito, M. Ishimaru, Y. Hirotsu, J. A. Valdez, and K. E. Sickafus, Appl. Phys. Lett. 87, 241905 (2005).
28. P. Sigmund, Phys. Rev. 184, 383 (1969).
29. P. C. Zalm, J. Appl. Phys. 54, 2660 (1983).
30. J. Desimoni, H. Bernas, M. Behar, X. W. Lin, J. Washburn, and Z. Liliental-Weber, Appl. Phys. Lett. 62, 306 (1993).
31. N. Onda, J. Henz, E. Müller, K. A. Mäder, and H. von Känel, Appl. Surf. Sci. 56-58, 421 (1992).
32. H. Katsumata, Thin Solid Films 381, 244 (2001).
33. R. Scholz, U. Gösele, E. Niemann, D. Leidich, and F. Wischmeyer, Diamond Relat. Mater. 6, 1365 (1997).
34. K. J. Reeson, Microelectron. Eng. 50, 223 (2000).
35. M. Naito, M. Ishimaru, Y. Hirotsu, J. A. Valdez, and K. E. Sickafus, Nucl. Instrum. Methods Phys. Res. B (in press).
36. R. Ayache, E. Richter, and A. Bouabellou, Nucl. Instrum. Methods Phys. Res. B 216, 137 (2004).