Growth and profile modification of carbon nanotubes designed for field emission applications by hydrogen plasma pretreatment

Diamond and Related Materials

Volumn 15, Issue 4-8, 2006, Pages 1132-1137

  Wong, Y M ^a   Kang, W P ^a   Davidson, J L ^a   Choi, B K ^a   Huang, J H ^b  

^a VANDERBILT UNIVERSITY   (United States)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Carbon nanotubes; CVD; Field emission; Plasma pretreatment; Triode

Indexed keywords

CATALYSTS; CHEMICAL VAPOR DEPOSITION; DENSITY CONTROL (SPECIFIC GRAVITY); ELECTRIC FIELD EFFECTS; FIELD EMISSION DISPLAYS; HEAT TREATMENT; HYDROGEN; MICROWAVES; NANOSTRUCTURED MATERIALS; NICKEL; PLASMA APPLICATIONS; SILICON; THIN FILMS;

ELECTRIC FIELD DISTRIBUTION; FIELD EMISSION; MICROCATHODES; NANO-SIZED CATALYSTS; PLASMA PRETREATMENT; TRIODE;

CARBON NANOTUBES;

EID: 33745233454     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2005.12.046     Document Type: Article

References (37)

1. Harris P.J.F. Carbon Nanotubes and Related Structures: New Materials for the 21st century (1999), Cambridge University Press
2. Iijima S. Nature (Lond.) 354 56 (1991)
3. Choi W.B., Chung D.S., Kang J.H., Kim H.Y., Jin Y.W., Han I.T., Lee Y.H., Jung J.E., Lee N.S., Park G.S., and Kim J.M. Appl. Phys. Lett. 75 (1999) 3129
4. Hafner J., Cheung C., and Lieber C. Nature 398 (1999) 761
5. Wong Y.M., Kang W.P., Davidson J.L., Wisitsora-at A., and Soh K.L. Sens. Actuator B 93 (2003) 326
6. Ong K.G., Zeng K., and Grimes C.A. IEEE Sens. J. 2 (2002) 82
7. Tans S.J., Devoret M.H., Dai H., Thess A., Smalley R.E., Geerligs L.J., and Dekker C. Nature 386 (1997) 474
8. Robertson J., Milne W.I., Teo K.B.K., and Chhowalla M. XVI International Winterschool on Electronic Properties of Novel Materials, Kirchberg, Austria (March 2-9 2002) 537
9. Liu C., Fan Y.Y., Liu M., Cong H.T., Cheng H.M., and Dresselhaus M.S. Science 286 1127 (1999)
10. Lee J.U. Appl. Phys. Lett. 87 (2005) 073101
11. Wind S.J., Appenzeller J., Martel R., Derycke V., and Avouris Ph. Appl. Phys. Lett. 80 (2002) 3817
12. Baughman R.H., Zakhidov A.A., and de Heer W.A. Science 297 (2002) 787
13. Legoas S.B., Coluci V.R., Braga S.F., Coura P.Z., Dantas S.O., and Galvao D.S. Nanotechnology 15 (2004) S184
14. Zhang J., Cheng Y., Lee Y.Z., Gao B., Qiu Q., Lin W.L., Lalush D., Lu J.P., and Zhou O. Rev. Sci. Instrum. 76 (2005) 094301
15. Zhu W. Vacuum Microlelectronics (2001), John Wiley & Sons
16. Li W.Z., Xie S.S., Qian L.X., Chang B.H., Zou B.S., Zhou W.Y., Zhao R.A., and Wang G. Science 274 (1996) 1701
17. Ren Z.F., Huang Z.P., Xu J.W., Wang J.H., Bush P., Siegal M.P., and Provencio P.N. Science 282 (1998) 1105
18. Merkulov V.I., Lowndes D.H., Wei Y.Y., Eres G., and Voelkl E. Appl. Phys. Lett. 76 (2000) 3555
19. Semet V., Binh V.T., Vincent P., Guillot D., Teo K.B.K., Chhowalla M., Amaratunga G.A.J., Milne W.I., Legagneux P., and Pribat D. Appl. Phys. Lett. 81 (2002) 343
20. Tsai S.H., Chao C.W., Lee C.L., and Shih H.C. Appl. Phys. Lett. 74 (1999) 3462
21. Bower C., Zhu W., Jin S., and Zhou O. Appl. Phys. Lett. 77 (2000) 830
22. Choi J.H., et al. J. Appl. Phys. 94 (2003) 487
23. Wen H.-C., Yang K., Ou K.-L., Wu W.-F., Luo R.-C., and Chou C.-P. Microelectronic Engineering (2005) (online)
24. Uh H.S., Lee M., Choi S.R., Park S.S., Cho E.S., Lee J.D., and Kwon S.J. J. Korean Phys. Soc. 43 (2003) 924
25. Wong Y.M., Kang W.P., Davidson J.L., Choi B.K., Hofmeister W., and Huang J.H. Abstract of Advanced Diamond Conference/NanoCarbon 2005, Argonne, IL (May 15-19 2005)
26. Fowler R.H., and Nordheim L.W. Proc. R. Soc. Lond. 119 (1928) 173
27. Forbes R.G., and Jensen K.L. Ultramicroscopy 89 (2001) 17
28. Wong Y.M., Kang W.P., Davidson J.L., Hofmeister W., Wei S., and Huang J.H. J. Vac. Sci. Technol., B 23 (2005) 868
29. Ahn S.D., Song Y.H., Choi S.Y., Park J.B., Sohn J.I., Lee S.H., Lee J.H., and Cho K.I. Proceedings of the 14th International Vacuum Microelectronics Conference, 12-16 Aug. 2001, (2001), Davis, CA 55
30. Huh Y., Lee J.Y., Lee J.H., Lee T.J., Lyu S.C., and Lee C.J. Chem. Phys. Lett. 375 (2003) 388
31. Jang Y.T., Choi C.H., Ju B.K., Ahn J.H., and Lee Y.H. Thin Solid Films 436 (2003) 298
32. Hsu D.S.Y. Appl. Phys. Lett. 80 (2002) 2988
33. Chen K.J., Hong W.K., Lin C.P., Chen K.H., Chen L.C., and Cheng H.C. IEEE Electron Device Lett. 22 (2001) 516
34. Nicolaescu D., Filip L.D., Kanemaru S., and Itoh J. J. Vac. Sci. Technol., B 21 (2003) 366
35. Nicolaescu D., Filip L.D., Kanemaru S., and Itoh J. Jpn. J. Appl. Phys. 43 (2004) 485
36. Jo S.H., Wang D.Z., Huang J.Y., Li W.Z., Kempa K., and Ren Z.F. Appl. Phys. Lett. 85 (2004) 810
37. Shiraishi M., and Ata M. Carbon 39 (2001) 1913