Diamond ablators for inertial confinement fusion

Fusion Science and Technology

Volumn 49, Issue 4, 2006, Pages 737-742

  Biener, Juergen ^a   Mirkarimi, Paul B ^a   Tringe, Joseph W ^a   Baker, Sherry L ^a   Wang, Yinmin ^a   Kucheyev, Sergei O ^a   Teslich, Nick E ^a   Wu, Kuang Jen J ^a   Hamza, Alex V ^a   Wild, Christoph ^b   Woerner, Eckhard ^b   Koidl, Peter ^b   Bruehne, Kai ^c   Fecht, Hans Joerg ^c  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b FRAUNHOFER INSTITUTE FOR APPLIED SOLID STATE PHYSICS IAF   (Germany)

^c UNIVERSITY OF ULM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; INERTIAL CONFINEMENT FUSION; NANOSTRUCTURED MATERIALS; SILICON;

ATOMIC DENSITY; DIAMOND ABLATORS; MICROFABRICATION; SILICON MANDRELS;

ABLATION;

EID: 33745018856     PISSN: 15361055     EISSN: None     Source Type: Journal    
DOI: 10.13182/FST49-737     Document Type: Conference Paper

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