Three-dimensional and multimaterial microfabrication using focused-ion-beam chemical-vapor deposition and its application to processing nerve electrodes

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 3158-3162

  Hoshino, T ^a,b   Kawamori, M ^b   Suzuki, T ^a   Matsui, S ^b   Mabuchi, K ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY; ELECTRIC CONDUCTORS; ELECTRIC WIRE; ELECTRODES; ETCHING; FABRICATION; ION BEAMS; IRRADIATION; NANOSTRUCTURED MATERIALS; NEUROPHYSIOLOGY; NOZZLES; RAMAN SCATTERING; SPUTTERING; SYNCHRONIZATION; TUNGSTEN COMPOUNDS;

BEAM IRRADIATION; CARBON MICROTUBES; REGENERATIVE ELECTRODES; REGENERATIVE NERVE FIBERS; THREE-DIMENSIONAL PROCESSING;

INTERFACES (MATERIALS);

EID: 13244291773     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1821581     Document Type: Conference Paper

References (7)

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