-
1
-
-
66449119228
-
-
"ITRS Roadmap," at http://public.itrs.net/Files/2002Update-Litho.pdf. 2 J. F. Chen, T. Laidig, K. E. Wampler, R. Caldwell, K. H. Nakagawa, and A. Liebchen, "A practical technology path to sub-0.10 micron process generations via enhanced optical lithography," in Photomask Technology, F. Abboud and B. J. Grenon, eds., Proc. SPIE 3873, 995-1016 (1999).
-
ITRS Roadmap
-
-
-
2
-
-
0033335459
-
A practical technology path to sub-0.10 micron process generations via enhanced optical lithography
-
F. Abboud and B. J. Grenon, eds., Proc. SPIE 3873
-
J. F. Chen, T. Laidig, K. E. Wampler, R. Caldwell, K. H. Nakagawa, and A. Liebchen, "A practical technology path to sub-0.10 micron process generations via enhanced optical lithography," in Photomask Technology, F. Abboud and B. J. Grenon, eds., Proc. SPIE 3873, 995-1016 (1999).
-
(1999)
Photomask Technology
, pp. 995-1016
-
-
Chen, J.F.1
Laidig, T.2
Wampler, K.E.3
Caldwell, R.4
Nakagawa, K.H.5
Liebchen, A.6
-
3
-
-
0030316339
-
Mathematical and CAD framework for proximity correction
-
G. E. Fuller, ed., Proc. SPIE 2726
-
N. Cobb, A. Zakhor, and E. Miloslavsky, "Mathematical and CAD framework for proximity correction," in Optical Microlithography, G. E. Fuller, ed., Proc. SPIE 2726, 208-221 (1996).
-
(1996)
Optical Microlithography
, pp. 208-221
-
-
Cobb, N.1
Zakhor, A.2
Miloslavsky, E.3
-
4
-
-
0000728551
-
Optical proximity correction for intermediate-pitch features using sub-resolution scattering bars
-
J. F. Chen, T. Laidig, K. E. Wampler, and R. Caldwell, "Optical proximity correction for intermediate-pitch features using sub-resolution scattering bars," J. Vac. Sci. Technol. B 15, 2426-2433 (1997).
-
(1997)
J. Vac. Sci. Technol. B
, vol.15
, pp. 2426-2433
-
-
Chen, J.F.1
Laidig, T.2
Wampler, K.E.3
Caldwell, R.4
-
5
-
-
2942708848
-
Resolution enhancement with OPC/PSM
-
F. M. Schellenberg, "Resolution enhancement with OPC/PSM," Future Fab Intl., 9 (2000).
-
(2000)
Future Fab Intl.
, vol.9
-
-
Schellenberg, F.M.1
-
6
-
-
0019612832
-
Reduction of errors of microphotographic reproductions by optimal corrections of original masks
-
B. E. A. Saleh, "Reduction of errors of microphotographic reproductions by optimal corrections of original masks," Opt. Eng. 20, 781-784 (1981).
-
(1981)
Opt. Eng.
, vol.20
, pp. 781-784
-
-
Saleh, B.E.A.1
-
7
-
-
33645667614
-
Geometrical theory of diffraction
-
J. B. Keller, "Geometrical theory of diffraction," J. Opt. Soc. Am. 52, 116-130 (1962).
-
(1962)
J. Opt. Soc. Am.
, vol.52
, pp. 116-130
-
-
Keller, J.B.1
-
8
-
-
0017495082
-
Image formation with coherent and partially coherent light
-
H. H. Hopkins, "Image formation with coherent and partially coherent light," Photograph. Sci. Eng. 21, 114-122 (1977).
-
(1977)
Photograph. Sci. Eng.
, vol.21
, pp. 114-122
-
-
Hopkins, H.H.1
-
9
-
-
0038623410
-
Algebraic expressions of shape amplitudes of polygons and polyhedra
-
J. Komrska, "Algebraic expressions of shape amplitudes of polygons and polyhedra," Optik 80, 171-183 (1988).
-
(1988)
Optik
, vol.80
, pp. 171-183
-
-
Komrska, J.1
-
16
-
-
0141724699
-
Extending a GTD-based image formation technique to EUV lithography
-
R. L. Engelstad, ed., Proc. SPIE 5037
-
A. Khoh, D. Flagello, T. Milster, B.-I. Choi, G. S. Samudra, and Y-H. Wu, "Extending a GTD-based image formation technique to EUV lithography," in Emerging Lithographic Technologies, R. L. Engelstad, ed., Proc. SPIE 5037, 682-689 (2003).
-
(2003)
Emerging Lithographic Technologies
, pp. 682-689
-
-
Khoh, A.1
Flagello, D.2
Milster, T.3
Choi, B.-I.4
Samudra, G.S.5
Wu, Y.-H.6
|