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Volumn 21, Issue 6, 2004, Pages 959-967

Image formation by use of the geometrical theory of diffraction

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION; FOURIER TRANSFORMS; GEOMETRICAL OPTICS; IMAGE RECONSTRUCTION; LIGHT REFLECTION; MASKS; MATHEMATICAL MODELS; ONE DIMENSIONAL; PHOTOLITHOGRAPHY; RAY TRACING; TWO DIMENSIONAL; VECTORS;

EID: 2942706012     PISSN: 10847529     EISSN: None     Source Type: Journal    
DOI: 10.1364/JOSAA.21.000959     Document Type: Article
Times cited : (10)

References (16)
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    • ITRS Roadmap
  • 2
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    • A practical technology path to sub-0.10 micron process generations via enhanced optical lithography
    • F. Abboud and B. J. Grenon, eds., Proc. SPIE 3873
    • J. F. Chen, T. Laidig, K. E. Wampler, R. Caldwell, K. H. Nakagawa, and A. Liebchen, "A practical technology path to sub-0.10 micron process generations via enhanced optical lithography," in Photomask Technology, F. Abboud and B. J. Grenon, eds., Proc. SPIE 3873, 995-1016 (1999).
    • (1999) Photomask Technology , pp. 995-1016
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  • 3
    • 0030316339 scopus 로고    scopus 로고
    • Mathematical and CAD framework for proximity correction
    • G. E. Fuller, ed., Proc. SPIE 2726
    • N. Cobb, A. Zakhor, and E. Miloslavsky, "Mathematical and CAD framework for proximity correction," in Optical Microlithography, G. E. Fuller, ed., Proc. SPIE 2726, 208-221 (1996).
    • (1996) Optical Microlithography , pp. 208-221
    • Cobb, N.1    Zakhor, A.2    Miloslavsky, E.3
  • 4
    • 0000728551 scopus 로고    scopus 로고
    • Optical proximity correction for intermediate-pitch features using sub-resolution scattering bars
    • J. F. Chen, T. Laidig, K. E. Wampler, and R. Caldwell, "Optical proximity correction for intermediate-pitch features using sub-resolution scattering bars," J. Vac. Sci. Technol. B 15, 2426-2433 (1997).
    • (1997) J. Vac. Sci. Technol. B , vol.15 , pp. 2426-2433
    • Chen, J.F.1    Laidig, T.2    Wampler, K.E.3    Caldwell, R.4
  • 5
    • 2942708848 scopus 로고    scopus 로고
    • Resolution enhancement with OPC/PSM
    • F. M. Schellenberg, "Resolution enhancement with OPC/PSM," Future Fab Intl., 9 (2000).
    • (2000) Future Fab Intl. , vol.9
    • Schellenberg, F.M.1
  • 6
    • 0019612832 scopus 로고
    • Reduction of errors of microphotographic reproductions by optimal corrections of original masks
    • B. E. A. Saleh, "Reduction of errors of microphotographic reproductions by optimal corrections of original masks," Opt. Eng. 20, 781-784 (1981).
    • (1981) Opt. Eng. , vol.20 , pp. 781-784
    • Saleh, B.E.A.1
  • 7
    • 33645667614 scopus 로고
    • Geometrical theory of diffraction
    • J. B. Keller, "Geometrical theory of diffraction," J. Opt. Soc. Am. 52, 116-130 (1962).
    • (1962) J. Opt. Soc. Am. , vol.52 , pp. 116-130
    • Keller, J.B.1
  • 8
    • 0017495082 scopus 로고
    • Image formation with coherent and partially coherent light
    • H. H. Hopkins, "Image formation with coherent and partially coherent light," Photograph. Sci. Eng. 21, 114-122 (1977).
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    • Hopkins, H.H.1
  • 9
    • 0038623410 scopus 로고
    • Algebraic expressions of shape amplitudes of polygons and polyhedra
    • J. Komrska, "Algebraic expressions of shape amplitudes of polygons and polyhedra," Optik 80, 171-183 (1988).
    • (1988) Optik , vol.80 , pp. 171-183
    • Komrska, J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.