SCOPUS 정보 검색 플랫폼

Volumn 57, Issue , 2003, Pages 1271-1277

Deposition of high-k dielectric oxide films by liquid injection MOCVD

Author keywords

Hafnium oxide; Lanthanum silicate; MOCVD; Precursors; Zirconium oxide

Indexed keywords

ELECTRIC CURRENT MEASUREMENT; FILM GROWTH; HAFNIUM COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; VOLTAGE MEASUREMENT; ZIRCONIA;

HAFNIUM OXIDE; LANTHANUM SILICATE; LIQUID INJECTION; PRECURSORS;

DIELECTRIC FILMS;

EID: 33744794406 PISSN: 10584587 EISSN: 16078489 Source Type: Conference Proceeding
DOI: 10.1080/714040784 Document Type: Article

Times cited : (6)

References (12)

1
- 0035872897
- G. D. Wilk, R. M. Wallace, and J. M. Anthony, J. Appl. Phys. 89, 5243 (2001).
- (2001) J. Appl. Phys. , vol.89 , pp. 5243
- Wilk, G.D.¹ Wallace, R.M.² Anthony, J.M.³

2
- 0034180064
- R. C. Smith, T. Ma, N. Hoilien, L. Y. Tsung, M. J. Bevan, L. Colombo, J. Roberts, S. A. Campbell, and W. Gladfelter, Adv. Mater. Opt. Electron. 10, 105 (2000).
- (2000) Adv. Mater. Opt. Electron. , vol.10 , pp. 105
- Smith, R.C.¹ Ma, T.² Hoilien, N.³ Tsung, L.Y.⁴ Bevan, M.J.⁵ Colombo, L.⁶ Roberts, J.⁷ Campbell, S.A.⁸ Gladfelter, W.⁹

3
- 0036717953
- A. C. Jones, J. Mater. Chem. 12, 2576 (2002).
- (2002) J. Mater. Chem. , vol.12 , pp. 2576
- Jones, A.C.¹

4
- 0035502045
- Y. Oshita, A. Ogura, A. Hoshino, S. Hiiro, and H. Machida, J. Cryst. Growth 233, 292 (2001).
- (2001) J. Cryst. Growth , vol.233 , pp. 292
- Oshita, Y.¹ Ogura, A.² Hoshino, A.³ Hiiro, S.⁴ Machida, H.⁵

5
- 0000876411
- P. A. Williams, J. L. Roberts, A. C. Jones, P. R. Chalker, N. L. Tobin, J. F. Bickley, H. O. Davies, L. M. Smith, and T. J. Leedham, Chem. Vap. Deposition 8, 163 (2002).
- (2002) Chem. Vap. Deposition , vol.8 , pp. 163
- Williams, P.A.¹ Roberts, J.L.² Jones, A.C.³ Chalker, P.R.⁴ Tobin, N.L.⁵ Bickley, J.F.⁶ Davies, H.O.⁷ Smith, L.M.⁸ Leedham, T.J.⁹

6
- 0025718617
- Y. Shiokawa, R. Amano, A. Nomura, and M. Yagi, J. Radioanal, Nucl. Chem. 152, 373 (1991).
- (1991) J. Radioanal, Nucl. Chem. , vol.152 , pp. 373
- Shiokawa, Y.¹ Amano, R.² Nomura, A.³ Yagi, M.⁴

7
- 37049123619
- D. C. Bradley, J. S. Ghotra, and F. A. Hart, J. Chem. Soc., Dalton Trans. 1021 (1973).
- (1973) J. Chem. Soc., Dalton Trans. , pp. 1021
- Bradley, D.C.¹ Ghotra, J.S.² Hart, F.A.³

8
- 0037057268
- S. Taylor, P. A. Williams, J. L. Roberts, A. C. Jones, and P. R. Chalker, IEEE Electron. Lett. 38, 1285 (2002).
- (2002) IEEE Electron. Lett. , vol.38 , pp. 1285
- Taylor, S.¹ Williams, P.A.² Roberts, J.L.³ Jones, A.C.⁴ Chalker, P.R.⁵

9
- 0024755421
- J. F. Zhang, S. Taylor, P. Watkinson, and W. Eccleston, J. Appl. Surf. Sci. 39, 374 (1989).
- (1989) J. Appl. Surf. Sci. , vol.39 , pp. 374
- Zhang, J.F.¹ Taylor, S.² Watkinson, P.³ Eccleston, W.⁴

10
- 0004277486
- (Wiley), and references therein
- E. R. Nicollian and J. Brews, in MOS Physics and Technology (Wiley, 1982), and references therein.
- (1982) MOS Physics and Technology
- Nicollian, E.R.¹ Brews, J.²

11
- 0012720666
- H. C. Aspinall, P. A. Williams, J. Gaskell, A. C. Jones, J. L. Roberts, L. M. Smith, P. R. Chalker, and G. W. Critchlow, Chem. Vap. Deposition 9, 7 (2003).
- (2003) Chem. Vap. Deposition , vol.9 , pp. 7
- Aspinall, H.C.¹ Williams, P.A.² Gaskell, J.³ Jones, A.C.⁴ Roberts, J.L.⁵ Smith, L.M.⁶ Chalker, P.R.⁷ Critchlow, G.W.⁸

12
- 0035848123
- M. Copel, E. Cartier, and F. M. Ross, Appl. Phys. Lett. 78, 1607 (2001).
- (2001) Appl. Phys. Lett. , vol.78 , pp. 1607
- Copel, M.¹ Cartier, E.² Ross, F.M.³

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.