Variable pressure electron beam lithography (VP-eBL): A new tool for direct patterning of nanometer-scale features on substrates with low electrical conductivity

Nano Letters

Volumn 6, Issue 5, 2006, Pages 963-968

  Myers, Benjamin D ^a   Dravid, Vinayak P ^a  

^a Northwestern University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE-BALANCE MECHANISMS; PATTERN DISTORTION ARTIFACTS; PROXIMITY EFFECTS; VARIABLE PRESSURE SCANNING ELECTRON MICROSCOPE (VPSEM);

ELECTRIC CONDUCTIVITY; HIGH PRESSURE EFFECTS; INSULATING MATERIALS; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES;

ELECTRON BEAM LITHOGRAPHY;

EID: 33744789429     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl0601278     Document Type: Article

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