Deposition of high-quality TiO2 films by RF magnetron sputtering with an auxiliary permanent magnet

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 7 SUPPL. B, 1997, Pages 4917-4921

  Okimura, Kunio ^a   Shibata, Akira ^a  

^a FUKUI NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

Author keywords

Auxiliary permanent magnet; High refractive index; Kinetic energy distribution; rf magnetron sputtering; Rutile TiO2 film; Substrate incident ion

Indexed keywords

FILM GROWTH; IONS; MAGNETIC FIELD EFFECTS; MAGNETRON SPUTTERING; PERMANENT MAGNETS; REFRACTIVE INDEX; SPUTTER DEPOSITION; THIN FILMS;

KINETIC ENERGY; RUTILE FILMS; SUBSTRATE INCIDENT IONS;

TITANIUM DIOXIDE;

EID: 0031175872     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.4917     Document Type: Article

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