Evolution of epitaxial titanium silicide nanocrystals as a function of growth method and annealing treatments

Applied Surface Science

Volumn 252, Issue 15, 2006, Pages 5355-5360

  Goldfarb, I ^a   Grossman, S ^a   Cohen Taguri, G ^a  

^a TEL AVIV UNIVERSITY   (Israel)

Author keywords

Scanning tunneling microscopy; Self assembled nanostructures; Silicides; Vapor phase epitaxy

Indexed keywords

ANNEALING; SCANNING TUNNELING MICROSCOPY; THERMODYNAMIC STABILITY; TITANIUM COMPOUNDS; VAPOR PHASE EPITAXY; VLSI CIRCUITS;

NANOCRYSTALS; SELF-ASSEMBLED NANOSTRUCTURES; SILICIDESSILICIDES; TITANIUM SILICIDE; WULF-KAISHEW THEOREM;

NANOSTRUCTURED MATERIALS;

EID: 33744509146     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.12.026     Document Type: Article

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