Smoothing of diamond-turned substrates for extreme ultraviolet lithography illuminators

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5193, Issue , 2004, Pages 98-104

  Soufli, Regina ^a   Spiller, Eberhard ^a   Schmidt, Mark A ^a   Robinson, Jeff C ^a   Baker, Sherry L ^a   Ratti, Susan ^a   Johnson, Michael A ^a   Gullikson, Eric M ^b  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

Diamond turned optics; Extreme ultraviolet lithography; Mo Si multilayers; Polyimide; Smoothing

Indexed keywords

DIAMONDS; ILLUMINATION METERS; LIGHT REFLECTION; MATHEMATICAL MODELS; POLYIMIDES; STRENGTH OF MATERIALS; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION;

DIAMOND-TURNED OPTICS; EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY; MO/SI MULTILAYERS; SMOOTHING;

PHOTOLITHOGRAPHY;

EID: 1942518337     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.509220     Document Type: Conference Paper

References (12)

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