New amorphous fluoropolymers of tetrafluoroethylene with fluorinated and non-fluorinated tricyclononenes. Semiconductor photoresists for imaging at 157 and 193 nm

Macromolecules

Volumn 39, Issue 9, 2006, Pages 3252-3261

  Feiring, Andrew E ^a   Crawford, Michael K ^a   Farnham, William B ^a   Feldman, Jerald ^a   French, Roger H ^a   Junk, Christopher P ^a   Leffew, Kenneth W ^a   Petrov, Viacheslav A ^a   Qiu, Weiming ^a   Schadt III, Frank L ^a   Tran, Hoang V ^a   Zumsteg, Fredrick C ^a  

^a DUPONT COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CYCLOADDITION; PHOTOACID GENERATOR; TETRAFLUOROETHYLENE (TFE);

ESTERS; GLASS TRANSITION; MONOMERS; OLEFINS; ORGANIC SOLVENTS; SEMICONDUCTOR MATERIALS;

PHOTORESISTS;

EID: 33744493391     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma060070b     Document Type: Article

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