Soft landing of silicon nanocrystals in plasma enhanced chemical vapor deposition

Applied Physics Letters

Volumn 88, Issue 20, 2006, Pages

  Chaâbane, Nihed ^a   Suendo, Veinardi ^a   Vach, Holger ^a   Roca i Cabarrocas, Pere ^a  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; CHEMICAL VAPOR DEPOSITION; ELECTRIC POTENTIAL; PHOTOLUMINESCENCE; SILICON; SUBSTRATES; THIN FILMS;

FILM DEPOSITION; NANOCRYSTALLINE FILMS; NANOCRYSTALS; SOFT LANDING;

NANOSTRUCTURED MATERIALS;

EID: 33646894462     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2204439     Document Type: Article

References (19)

1. P. Balls, Nature (London) 409, 974 (2001).
2. A. Dutta, S. P. Lee, Y. Hayafune, S. Hatani, and S. Oda, Jpn. J. Appl. Phys., Part 1 39, 264 (2000).
3. D. B. Geohegan, A. A. Puretzky, G. Duscher, and S. J. Pennycook, Appl. Phys. Lett. 72, 2987 (1998).
4. M. L. Ostraat, J. W. De Blauwe, M. L. Green, L. D. Bell, M. L. Brongersma, J. Casperson, R. C. Flagan, and H. A. Atwater, Appl. Phys. Lett. 79, 433 (2001).
5. P. Roca i Cabarrocas, A. Fontcuberta, and Y. Poissant, Thin Solid Films 403-404, 39 (2002).
6. P. Roca i Cabarrocas, A. Fontcuberta, S. Lebib, and Y. Poissant, Pure Appl. Chem. 74, 359 (2002).
7. A. Fontcuberta, P. Roca i Cabarrocas, and C. Clerc, Phys. Rev. B 69, 125307 (2004).
8. N. Chaâbane, P. Roca i Cabarrocas, and H. Vach, J. Non-Cryst. Solids 338-340, 51 (2004).
9. J. P. Boeuf and C. Punset, in Dusty Plasma, edited by, A. Bouchoule, (Wiley, New York, 1999).
10. E. A. G. Hamers, A. Fontcuberta, C. Niikura, R. Brenot, and P. Roca i Cabarrocas, J. Appl. Phys. 88, 3674 (2000).
11. G. Viera, S. Huet, and L. Boufendi, J. Appl. Phys. 90, 4175 (2001).
12. K. W. Adu, H. R. Gutírrez, U. J. Kim, G. U. Sumanasekera, and P. C. Eklund, Nano Lett. 5, 409 (2005).
13. G. N. Parsons, J. H. Souk, and J. Batey, J. Appl. Phys. 70, 1553 (1991).
14. A. Achiq, R. Rizk, F. Gourbilleau, and P. Voivenel, Thin Solid Films 348, 74 (1999).
15. D. Beeman, R. Tsu, and M. F. Thorpe, Phys. Rev. B 32, 874 (1985).
16. B. Kalache, A. I. Kosarev, R. Vanderhaghen, and P. Roca i Cabarrocas, J. Appl. Phys. 93, 1262 (2003).
17. R. Neuendorf, R. E. Palmer, and R. Smith, Appl. Phys. Lett. 77, 3003 (2000).
18. M. Watanabe, N. Uchida, and T. Kanayama, Phys. Rev. B 61, 7219 (2000).
19. N. M. Park, C. J. Choi, T. Y. Seong, and S. J. Park, Phys. Rev. Lett. 86, 1355 (2001).