Design of folded monopole array antenna used for large area plasma production

IEEE Antennas and Propagation Society, AP-S International Symposium (Digest)

Volumn 1, Issue , 2004, Pages 1026-1029

  Sato, Hiroyasu ^a   Tamashiro, Katsuaki ^a   Sasaki, Kazuyuki ^a   Takagi, Tomoko ^b   Ueda, Masashi ^b   Watabe, Yoshimi ^b   Sawaya, Kunio ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b IHI CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CORRELATION METHODS; ELECTRIC CURRENTS; ELECTRIC IMPEDANCE; ELECTROMAGNETIC FIELD EFFECTS; FINITE DIFFERENCE METHOD; LIQUID CRYSTAL DISPLAYS; MATHEMATICAL MODELS; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA THEORY; TIME DOMAIN ANALYSIS;

CURRENT DISTRIBUTION; FULL-WAVE ANALYSIS; IMPEDANCE MATCHING; MONOPOLE ARRAY ANTENNAS;

ANTENNA ARRAYS;

EID: 4544345055     PISSN: 15223965     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/aps.2004.1329848     Document Type: Conference Paper

References (3)

1. M. A. Lieberman and A. J. Lichtenberg, "Principles of plasma discharges and materials processing," John Willey Sons, 2002.
2. H. Sato, K. Tamashiro, K. Sawaya, T. Takagi, M. Ueda, and Yoshimi Watabe, "FDTD Analysis of Wire Antenna Used for Process Plasma," Proc. 2001 IEEE Antennas and Propagation Society International Symposium, Vol. 3, pp.561-564, 2001.
3. R. Luebbers F. Hunsberger and K. Kunz, "Finite-difference time-domain analysis of gyrotropic media-i:magnetized plasma," IEEE Trans. Antennas Propagat., vol. 40, no. 12, pp. 1489-1495, 1992.