Theoretical study of water-induced oxidation reaction on a bare Si surface: H2O + Si(1 0 0)-(2 × 1)

Chemical Physics Letters

Volumn 424, Issue 1-3, 2006, Pages 133-138

  Watanabe, Hidekazu ^a   Nanbu, Shinkoh ^a   Wang, Zhi Hong ^b   Aoyagi, Mutsumi ^a  

^a KYUSHU UNIVERSITY   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; ELECTRON TRANSITIONS; OXIDATION; PHASE EQUILIBRIA; QUENCHING; WATER;

CLUSTER MODEL; EQUILIBRIUM CONDITION; MOLECULAR ORBITAL METHOD; THERMAL RELAXATION; WATER-INDUCED OXIDATION REACTION;

SILICON;

EID: 33646831475     PISSN: 00092614     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cplett.2006.04.041     Document Type: Article

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