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Volumn 35, Issue 4, 2006, Pages 771-776
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Digital etching of III-N materials using a two-step Ar/KOH technique
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Author keywords
Digital etch; GaN; KOH
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Indexed keywords
ARGON PLASMA EXPOSURE;
DIGITAL ETCH;
GAN;
KOH;
ARGON;
GALLIUM NITRIDE;
NITRIDES;
PLASMA APPLICATIONS;
POTASSIUM COMPOUNDS;
REACTIVE ION ETCHING;
SURFACE TREATMENT;
SEMICONDUCTOR MATERIALS;
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EID: 33646718602
PISSN: 03615235
EISSN: None
Source Type: Journal
DOI: 10.1007/s11664-006-0137-6 Document Type: Conference Paper |
Times cited : (8)
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References (9)
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