Correlation between optical properties and electronic parameters for mixed oxide thin films

Surface and Interface Analysis

Volumn 38, Issue 4, 2006, Pages 752-756

  Gracia, F ^a   Yubero, F ^a   Espinos, J P ^a   Holgado, J P ^a   Gonzalez Elipe A R ^a   Girardeau, T ^b  

^a UNIVERSITY OF SEVILLE   (Spain)

^b UNIVERSITÉ DE POITIERS   (France)

Author keywords

Auger parameter; Refractive index; SiO2; TiO 2 SiO2 thin films; TiO2

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; BAND STRUCTURE; CHEMICAL VAPOR DEPOSITION; COMPOSITION; OPTICAL CORRELATION; REFRACTIVE INDEX; SILICA; THIN FILMS; TITANIUM DIOXIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

AUGER PARAMETERS; BAND GAP ENERGIES; COMPLEX OXIDES; CORRELATIONS;

OPTICAL FILMS;

EID: 33646537828     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2273     Document Type: Conference Paper

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