Use of Auger- and photoelectron lines in the identification of chemical states of novel ternary Ti-Al-O films prepared by reactive magnetron sputtering ion plating

Thin Solid Films

Volumn 315, Issue 1-2, 1998, Pages 66-71

  Von Richthofen, A ^a   Cremer, R ^a   Domnick, R ^a   Neuschutz D ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

Al2O3; Anatase; MSIP; Rutile; Ti Al O; TiO2

Indexed keywords

ALUMINA; AUGER ELECTRON SPECTROSCOPY; FILM PREPARATION; MAGNETRON SPUTTERING; MORPHOLOGY; SILICON WAFERS; SPUTTER DEPOSITION; SUBSTRATES; TERNARY SYSTEMS; THERMAL EFFECTS; TITANIUM COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

REACTIVE MAGNETRON SPUTTERING ION PLATING;

SEMICONDUCTING FILMS;

EID: 0032473188     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00745-1     Document Type: Article

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