Thermodynamical analysis of the shape and size dispersion of InAs InP (001) quantum dots

Physical Review B - Condensed Matter and Materials Physics

Volumn 73, Issue 16, 2006, Pages

  Michon, A ^a   Sagnes, I ^a   Patriarche, G ^a   Beaudoin, G ^a   Merat Combes M N ^a   Saint Girons, G ^a  

^a CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33646381117     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.73.165321     Document Type: Article

References (20)

1. D. Hadass, R. Alizon, H. Dery, V. Mikhelashvili, G. Einsenstein, R. Schwertberger, A. Somers, J. P. Reitmaier, A. Forchel, M. Calligaro, S. Banropun, and M. Krakowski, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1832761 85, 5505 (2004).
2. K. Takemoto, Y. Sakuma, S. Hirose, T. Usuki, and N. Yokoyama, Jpn. J. Appl. Phys., Part 2 JAPLD8 0021-4922 10.1143/JJAP.43.L349 43, L349 (2004).
3. M. Gendry, C. Monat, J. Brault, P. Regreny, G. Hollinger, B. Salem, G. Guillot, T. Benyattou, C. Bru-Chevalier, G. Bremond, and O. Marty, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1690101 95, 4761 (2004).
4. Q. Gong, R. Nötzel, P. J. van Veldhoven, and J. H. Wolter, J. Cryst. Growth JCRGAE 0022-0248 10.1016/j.jcrysgro.2004.12.056 278, 67 (2005).
5. K. Kawaguchi, M. Ekawa, A. Kuramata, T. Akiyama, H. Ebe, M. Sugawara, and Y. Arakawa, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1814442 85, 4331 (2004).
6. N. Carlsson, T. Junno, L. Montelius, M.-E. Pistol, L. Samuelson, and W. Seifert, J. Cryst. Growth JCRGAE 0022-0248 10.1016/S0022-0248(98)00143-2 191, 347 (1998).
7. A. Michon, G. Saint-Girons, G. Beaudoin, I. Sagnes, L. Largeau, and G. Patriarche, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2150271 87, 253114 (2005).
8. L. Gonzalez, J. M. Garcia, R. Garcia, F. Briones, and J. Martinez-Pastor, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.125952 76, 1104 (2000).
9. J. Brault, M. Gendry, G. Grenet, G. Hollinger, J. Olivares, B. Salem, T. Benyattou, and G. Brémond, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1481959 92, 506 (2002).
10. C. Paranthoen, N. Bertru, O. Dehaese, A. Le Corre, S. Loualiche, B. Lambert, and G. Patriarche, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1356449 78, 1751 (2001).
11. J. Tersoff and R. M. Tromp, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.70.2782 70, 2782 (1993).
12. H. Hwang, S. Yoon, H. Kwon, E. Yoon, H.-S. Kim, J. Y. Lee, and B. Cho, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1840123 85, 6383 (2004).
13. H. Li, J. Wu, Z. Wang, and T. Daniels-Race, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.124633 75, 1173 (1999).
14. L. González, J. M. García, R. García, F. Briones, J. Martínez-Pastor, and C. Ballesteros, Appl. Phys. Lett. APPLAB 0003-6951 76, 1224 (2000).
15. T. Hanada, B. H. Koo, H. Totsuka, and T. Yao, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.64.165307 64, 165307 (2001).
16. J. Marquez, L. Geelhaar, and K. Jacobi, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1365101 78, 2309 (2001).
17. E. Pehlke, N. Moll, A. Kley, and M. Scheffler, Appl. Phys. A: Mater. Sci. Process. APAMFC 0947-8396 10.1007/s003390050619 65, 525 (1997).
18. D. Fuster, M. Ujue-Gonzalez, L. Gonzalez, Y. Gonzalez, T. Ben, A. Ponce, S. I. Molina, and J. Martinez-Pastor, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1787155 85, 1424 (2004).
19. G. B. Stringfellow, Organometalic Vapor-Phase Epitaxy: Theory and Practice (Academic Press, San Diego, 1989).
20. M. Ishimura and T. Wada, J. Cryst. Growth JCRGAE 0022-0248 97, 542 (1989).