Study on the applications of SiC thin films to MEMS techniques through a fabrication process of cantilevers

Progress in Solid State Chemistry

Volumn 33, Issue 2-4 SPEC. ISS., 2005, Pages 309-315

  Hyun, J S ^a   Park, J H ^a,a   Moon, J S ^a   Kim, S H ^b   Choi, Y J ^b   Lee, N E ^a   Boo, J H ^a  

^a Sungkyunkwan University   (South Korea)

^b Korea Electronic Technology Institute (KETI)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRON ABSORPTION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROELECTROMECHANICAL DEVICES; OPTICAL RESOLVING POWER; THIN FILMS;

1,3-DISILABUTANE (DSB); DIETHYLMETHYLSILANE (DEMS); SILICON CARBIDE THIN FILMS;

SILICON CARBIDE;

EID: 33646355929     PISSN: 00796786     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.progsolidstchem.2005.11.030     Document Type: Article

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