Nano-scratch resistance study of nitrogenated amorphous carbon films prepared by unbalanced magnetron sputtering

Journal of Magnetism and Magnetic Materials

Volumn 303, Issue 2 SPEC. ISS., 2006, Pages

  Shi, J R ^a   Piramanayagam, S N ^a  

^a DATA STORAGE INSTITUTE   (Singapore)

Author keywords

Atomic force microscopy nano scratch; Nitrogenated amorphous carbon (a CNx); Raman scattering; Unbalanced magnetron sputtering

Indexed keywords

AMORPHOUS MATERIALS; ATOMIC FORCE MICROSCOPY; ATOMIC PHYSICS; CARBON; MAGNETRON SPUTTERING; RAMAN SPECTROSCOPY;

ATOMIC FORCE MICROSCOPY NANO-SCRATCH; NITROGENATED AMORPHOUS CARBON (A-CNX); UNBALANCED MAGNETRON SPUTTERING;

THIN FILMS;

EID: 33646257079     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2006.01.241     Document Type: Article

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