Exposure optimization in high-resolution e-beam lithography

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 780-783

  Hudek, Peter ^a   Beyer, Dirk ^b  

^a VORARLBERG UNIVERSITY OF APPLIED SCIENCES   (Austria)

^b Vistec Electron Beam GmbH   (Germany)

Author keywords

Direct writing; Electron beam lithography; Maskmaking; Proximity effect

Indexed keywords

COMPUTER AIDED SOFTWARE ENGINEERING; DATA ACQUISITION; NUMERICAL ANALYSIS; OPTICAL RESOLVING POWER; OPTICAL TRANSFER FUNCTION; OPTIMIZATION;

DIRECT WRITING; MASKMAKING; PROXIMITY EFFECT;

ELECTRON BEAM LITHOGRAPHY;

EID: 33646019861     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.184     Document Type: Article

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