Optimum PEC conditions under resist heating effect reduction for 90nm node mask writing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 2, 2002, Pages 792-799

  Park, Eui Sang ^a   Lee, Jong Hwa ^a   Park, Dong Il ^a   Jeong, Woo Gun ^a   Seo, Sun Kyu ^a   Kim, Jin Min ^a   Choi, Sang Soo ^a   Jeong, Soo Hong ^a  

^a Photronics PKL ^*  (United States)

Author keywords

EBM 3500B; Electron beam; Proximity effect correction; Resist heating

Indexed keywords

CODES (STANDARDS); ELECTRON BEAMS; ERROR CORRECTION; MASKS; PARAMETER ESTIMATION; THERMAL EFFECTS;

PROXIMITY EFFECT CORRECTION (PEC);

PHOTORESISTS;

EID: 0038303126     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.467899     Document Type: Article

References (4)

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