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Volumn 5645, Issue , 2005, Pages 100-108

Achieving CDU requirement for 90nm technology node and beyond with advanced mask making process technology

Author keywords

CD uniformity; CDU; Fogging effect; Global; Local; Proximity effect

Indexed keywords

COMPUTER SIMULATION; COMPUTER SOFTWARE; DENSITY (OPTICAL); ELECTRIC POTENTIAL; ELECTRON BEAMS; ELECTRON SCATTERING; MASKS; OPTICAL RESOLVING POWER; SCANNING;

EID: 20044370668     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.577008     Document Type: Conference Paper
Times cited : (2)

References (5)
  • 1
    • 0016572881 scopus 로고
    • Proximity effect in electron beam lithography
    • Nov./Dec.
    • T. H. P. Chang, J. Vac. Sci. Technol., "Proximity effect in electron beam lithography", vol. 12, No. 6, Nov./Dec. (1975) 1271.
    • (1975) J. Vac. Sci. Technol. , vol.12 , Issue.6 , pp. 1271
    • Chang, T.H.P.1
  • 2
    • 20044374791 scopus 로고    scopus 로고
    • Input parameter determination for PEC and FEC
    • Leica Microsystems Lithography GmbH, (Unpublished)
    • PROX-In "Input parameter determination for PEC and FEC", Software Document Description, Leica Microsystems Lithography GmbH, 2004 (Unpublished).
    • (2004) Software Document Description
  • 4
    • 0038303126 scopus 로고    scopus 로고
    • Optimum PEC conditions under resist heating effect reduction for 90nm node mask writing
    • SPIE-BACUS 2002
    • E.S. Park, J.H. Lee, D.I. Park, W.G. Jeong, S.K Seo, J.M. Kim, Sang-Soo Choi, Soo-Hong Jeong, "Optimum PEC conditions under resist heating effect reduction for 90nm node mask writing", SPIE-BACUS 2002, Proc. SPIE 4889 (2002) Part Two, 792-799.
    • (2002) Proc. SPIE , vol.4889 , Issue.2 PART , pp. 792-799
    • Park, E.S.1    Lee, J.H.2    Park, D.I.3    Jeong, W.G.4    Seo, S.K.5    Kim, J.M.6    Choi, S.-S.7    Jeong, S.-H.8
  • 5
    • 0035766248 scopus 로고    scopus 로고
    • Tool and process optimization for 100nm maskmaking using a 50kV variable shaped e-beam system
    • D. Beyer, D. Löffelmacher, G. Goedel, P. Hudek, B. Schnabel, T. Elster, "Tool and process optimization for 100nm maskmaking using a 50kV variable shaped e-beam system", Proc. SPIE 4562 (2002) 88.
    • (2002) Proc. SPIE , vol.4562 , pp. 88
    • Beyer, D.1    Löffelmacher, D.2    Goedel, G.3    Hudek, P.4    Schnabel, B.5    Elster, T.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.