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Volumn 5645, Issue , 2005, Pages 100-108
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Achieving CDU requirement for 90nm technology node and beyond with advanced mask making process technology
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Author keywords
CD uniformity; CDU; Fogging effect; Global; Local; Proximity effect
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Indexed keywords
COMPUTER SIMULATION;
COMPUTER SOFTWARE;
DENSITY (OPTICAL);
ELECTRIC POTENTIAL;
ELECTRON BEAMS;
ELECTRON SCATTERING;
MASKS;
OPTICAL RESOLVING POWER;
SCANNING;
CD UNIFORMITY;
CDU;
FOGGING EFFECTS;
GLOBAL;
LOCAL;
PROXIMITY EFFECTS;
PHOTOLITHOGRAPHY;
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EID: 20044370668
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.577008 Document Type: Conference Paper |
Times cited : (2)
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References (5)
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