A dual-EDM reverse damascene process for RF switches and other bulk metal devices

American Society of Mechanical Engineers, Micro-Electro Mechanical Systems Division, (Publications) MEMS

Volumn 7 MEMS, Issue , 2005, Pages 137-141

  Udeshi, K ^a   Richardson, M ^a   Hung, J J ^a,b   Que, L ^a,c   Rebeiz, G M ^a,d   Gianchandani, Y B ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

^b INTEL CORPORATION   (United States)

^c GE GLOBAL RESEARCH   (United States)

^d UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DAMASCENE PROCESS; LITHOGRAPHY-COMPATIBLE FABRICATION; MICRO-ELECTRO-DISCHARGE MACHINING; RF SWITCHES;

ELECTRIC DISCHARGES; FABRICATION; LITHOGRAPHY; METAL ANALYSIS; MICROSTRUCTURE;

ELECTRIC SWITCHES;

EID: 33645992111     PISSN: 1096665X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1115/IMECE2005-80913     Document Type: Conference Paper

References (10)

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