Submicron imaging with a planar silver lens

Applied Physics Letters

Volumn 84, Issue 22, 2004, Pages 4403-4405

  Melville, David O S ^a   Blaikie, Richard J ^a   Wolf, Conrad R ^a,b  

^a UNIVERSITY OF CANTERBURY   (New Zealand)

^b UNIVERSITY OF APPLIED SCIENCES   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; ATOMIC FORCE MICROSCOPY; COMPUTER SIMULATION; ETCHING; EVAPORATION; FINITE DIFFERENCE METHOD; FREQUENCIES; IMAGING TECHNIQUES; LIGHT SENSITIVE MATERIALS; PHOTOLITHOGRAPHY; POLYMETHYL METHACRYLATES; TIME DOMAIN ANALYSIS;

OPTICAL IMAGING; PATTERNED MASK; SUBMICRON IMAGING; VESELAGO MATERIAL (VM);

OPTICAL INSTRUMENT LENSES;

EID: 3042784803     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1757644     Document Type: Article

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