Simulation study of 'perfect lenses' for near-field optical nanolithography

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 97-103

  Blaikie, R J ^a   McNab, S J ^a  

^a UNIVERSITY OF CANTERBURY   (New Zealand)

Author keywords

Electromagnetic field simulation; Nanolithography; Optical lithography; Perfect lens; Plasmon

Indexed keywords

COMPUTER SIMULATION; ELECTROMAGNETIC FIELD EFFECTS; IMAGE ANALYSIS; LENSES; MASKS; NANOTECHNOLOGY; PHOTOLITHOGRAPHY;

ELECTROMAGNETIC FIELD SIMULATION;

MICROELECTRONICS;

EID: 0036643619     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00421-5     Document Type: Conference Paper

References (10)

1. Negative refraction makes a perfect lens
2. Experimental verification of a negative index of refraction
3. Light-coupling masks for lensless, sub-wavelength optical lithography
4. Sub-diffraction-limited patterning using evanescent near-field optical lithography
5. Patterning 100 nm features using deep-ultraviolet contact photolithography
6. Optical constants of the noble metals
7. Plasmon optics of structured silver films
8. Ion-assisted deposition of silver thin films