Effect of excess Pb in PT layers on microstructure and dielectric characteristic of PT/PZT/PT thin films

Integrated Ferroelectrics

Volumn 75, Issue , 2005, Pages 163-171

  Wang, Longhai ^a   Yu, Jun ^a   Yang, Weiming ^a   Wang, Yunbo ^a   Gao, Junxiong ^a  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Excess Pb content; Ferroelectric and dielectric characteristic; PT PZT PT thin films; Sol gel

Indexed keywords

CRYSTALLIZATION; DIELECTRIC PROPERTIES; MICROSTRUCTURE; PEROVSKITE; POLARIZATION; SANDWICH STRUCTURES; THIN FILMS;

EXCESS PB CONTENT; FERROELECTRIC AND DIELECTRIC CHARACTERISTIC; PT/PZT/PT THIN FILMS;

LEAD COMPOUNDS;

EID: 33645520915     PISSN: 10584587     EISSN: 16078489     Source Type: Conference Proceeding    
DOI: 10.1080/10584580500414333     Document Type: Conference Paper

References (26)

1. J. F. Scott and C. A. Paz Araujo, Science 246, 1400 (1989).
2. J. Lee, J. Johnson, A. Safari, et al., Appl. Phys. Lett. 63, 27 (1993).
3. Y. Fukuda and K. Aoki, Jpn. J. Appl. Phys. 36, 5793 (1997).
4. H. Suzuki, T. Koizumi, Y. Kondo, and S. Kaneko, J. Eur. Ceram. Soc. 19, 1397 (1999).
5. Hyung-Ho Parka, Il-Sup Jina, and Do-Hyun Kima, Thin Solid Films 332, 300 (1998).
6. Young Park, Kyu Won Jeong, and Joon Tae Song, Materials Letters 56, 481 (2002).
7. Zhitang Song, Jianxia Gao, Xiangrong Zhu, et al. Journal of Materials Science 36, 4285 (2001).
8. Jun-Kyu Yang, Woo Sik Kim, and Hyung-Ho Park, Thin Solid Films 739, 377-378 (2000).
9. E. Cattan, G. Velu, B. Jaber, et al. Appl. Phys. Lett. 70, 31 (1997).
10. Neung-Ho Cho and Ho-Gi Kim, Microelectronic Engineering 29, 243 (1995).
11. Weiguo LiuU, Jong Soo Ko, and Weiguang Zhu, Thin Solid Films 371, 254 (2000).
12. Chang Jung Kim, Yong Kyun Lee, Kyu Mann Lee, et al., IEEE ISSD 925 (2001).
13. Ki Hyun Yoon, Ji Hwan Shin, Jeong Hwan Park, et al., J. Appl. Phys. 83, 3626 (1998).
14. Neung-Ho Cho and Ho-Gi Kim, Microelectronic Engineering 29, 243 (1995).
15. K. Wasa, T. Satoh, and K. Tabata, J. Mater. Res. 9, 2925 (1994).
16. Hidekazu Doi et al., Jpn. J. Appl. Phys. 33, 5159 (1994).
17. P. Muralt, T. Maeder, L. Sagalowicz, et al., J. Appl. Phys. 83, 71 (1998).
18. F. F. C. Duval, R. A. Dorey, R. H. Haigh, et al., Thin Solid Films 444, 235 (2003).
19. Wen Gong, Jing-Feng Li, Xiangcheng Chu, et al., Acta Materialia 52, 2787 (2004).
20. Y. K. Wang, T. Y. Tseng, and Pang Lin, Appl. Phys. Lett. 80, 3790 (2002).
21. C. W. Law, K. Y. Tong, J. H. Li, et al., Thin Solid Films 354, 162 (1999).
22. Fan Wang and Seppo Leppavuori, J. Appl. Phys. 82, 1293 (1997).
23. Ren Tian-Ling, Zhang Lin-Tao, Wang Xiao-Ning, et al., Integrated Ferroelectrics 46, 47 (2002).
24. Kuo-Shung Liu, Tzu-Feng Tseng, and I-Nan Lin, Appl. Phys. Lett. 72, 1182 (1998).
25. K. Niwa, Y. Kotaka, M. Tomotani, et al., Acta mater. 48, 4755 (2000).
26. Yen-Chao Lai, Y. S. Gong, and Chiapyng Lee, Chemistry and Physics 51, 147 (1997).