Real time technique to measure the electrical resistivity of ultrathin films during growth in plasma environments

Review of Scientific Instruments

Volumn 74, Issue 7, 2003, Pages 3385-3389

  Barnat, E V ^a   Nagakura, D ^a   Lu, T M ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY; ELECTRODES; FILM GROWTH; PLASMAS; SPUTTER DEPOSITION;

INDUCED VOLTAGES;

ULTRATHIN FILMS;

EID: 0042768155     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1556947     Document Type: Article

References (3)

1. E. V. Barnat, P.-I. Wang, D. Nagakura, and T.-M. Lu, J. Appl. Phys. (to be published).
2. E. V. Barnat, P. I. Wang, and T.-M. Lu, J. Appl. Phys. 1, l (1937).
3. L. J. van der Pauw, Philips Res. Rep. 13, 1 (1958).