Intermittent bias application in kelvin probe force microscopy for accurate determination of surface potential

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 3 B, 2006, Pages 1931-1933

  Ono, Shiano ^a   Takahashi, Takuji ^a  

^a INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

Author keywords

Electrostatic force; Intermittent application; Quantum dots; Sampling; Spatial resolution

Indexed keywords

MICROSCOPIC EXAMINATION; OSCILLATORS (ELECTRONIC); SAMPLING; SELF ASSEMBLY; SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTOR QUANTUM DOTS;

ELECTROSTATIC FORCE; INTERMITTENT APPLICATION; KELVIN PROBE FORCE MICROSCOPY (KFM); SPATIAL RESOLUTION;

FORCE MEASUREMENT;

EID: 33645514878     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.1931     Document Type: Article

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