Conformality of Pb(Zr,Ti)O3 films deposited on trench structures having submicrometer diameter and various aspect ratios

Electrochemical and Solid-State Letters

Volumn 9, Issue 1, 2006, Pages

  Nagai, Atsushi ^a   Minamidate, Jun ^a   Asano, Gouji ^a   Choi, Chel Jong ^b   Cho, Choong Rae ^b   Park, Youngsoo ^b   Funakubo, Hiroshi ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CONFORMATIONS; LEAD METALLURGY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SUBSTRATES;

MOLAR RATIOS; PULSED-METALLORGANIC CHEMICAL VAPOR DEPOSITION; SUBMICROMETER DIAMETER; TRENCH SUBSTRATES;

THIN FILMS;

EID: 33645513281     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2137470     Document Type: Article

References (12)

1. J. F. Scott and C. A. Paz de Araujo, Science, 246, 1400 (1989).
2. O. Auciello, J. F. Scott, and R. Ramesh, Phys. Today, 51, 22 (1998).
3. J. K. Lee, M.-S. Lee, S. Hong, W. Lee, Y. K. Lee, S. Shin, and Y. Park, Jpn. J. Appl. Phys., Part 1, 41, 6690 (2002).
4. H. R. Kim, S. Jeong, C. B. Jeon, O. S. Kwon, C. S. Hwang, Y. K. Han, D. Y. Yang, and K. Y. Oh, J. Mater. Res., 16, 3583 (2001).
5. Y. Otani, N. Abe, M. Miyake, S. Okamura, and T. Shiosaki, Jpn. J. Appl. Phys., Part 1, 44, 5133 (2005).
6. A. Yamashita and T. Tatsumi, Appl. Phys. Lett., 67, 1208 (1995).
7. A. Yamashita, T. Tatsumi, and K. Miyanaga, Jpn. J. Appl. Phys., Part 1, 34, 4167 (1995).
8. K. Nagashima, M. Aratani, and H. Funakubo, Jpn. J. Appl. Phys., Part 2, 39, L996 (2000).
9. G. Asano, A. Nagai, and H. Funakubo, In preparation.
10. C. S. Hwang, S. Y. No, J. Park, H. J. Kim, H. J. Cho, Y. K. Han, and K. Y. Oh, J. Electrochem. Soc., 149, G585 (2002).
11. T. Oikawa, H. Morioka, A. Nagai, H. Funakubo, and K. Saito, Appl. Phys. Lett., 85, 1754 (2004).
12. T. Oikawa, H. Funakubo, H. Morioka, and K. Saito, Integr. Ferroelectr., 59, 1421 (2003).