Differential surface-charge-induced damage of dielectrics and leakage kinetics during plasma processing

Electrochemical and Solid-State Letters

Volumn 9, Issue 1, 2006, Pages

  Abatchev, M K ^a   Murali, S Krupakar ^a  

^a MICRON TECHNOLOGY INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ELECTRONS; IONS; LEAKAGE CURRENTS; PLASMAS; SILICON; SUBSTRATES; SURFACE PHENOMENA;

KELVIN PROBE; MONOTONIC FUNCTION; PLASMA PROCESSING;

DIELECTRIC FILMS;

EID: 33645505611     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2130311     Document Type: Article

References (10)

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