Relationship between the charging damage of test structures and the deposited charge on unpatterned wafers exposed to an electron cyclotron resonance plasma

Applied Physics Letters

Volumn 72, Issue 10, 1998, Pages 1143-1145

  Cismaru, C ^a   Shohet, J L ^a   Nauka, K ^b   Friedmann, J B ^c  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b HEWLETT PACKARD LABORATORIES   (United States)

^c TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 22244476724     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.120996     Document Type: Article

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