Dry etching of LaNiO3 thin films using inductively coupled plasma

Thin Solid Films

Volumn 506-507, Issue , 2006, Pages 217-221

  Kim, Gwan Ha ^a   Kim, Dong Pyo ^a   Kim, Kyoung Tae ^a   Kim, Chang Il ^a   Lee, Cheol In ^b   Kim, Tae Hyung ^c  

^a Chung Ang University   (South Korea)

^b Ansan University   (South Korea)

^c Yeojoo Technical College   (South Korea)

Author keywords

Etching; Inductively coupled plasma; Langmuir probe; OES

Indexed keywords

ARGON; CHLORINE; ELECTRONS; FLUXES; LANGMUIR BLODGETT FILMS; LANTHANUM; LITHIUM NIOBATE; NICKEL; OXYGEN; PLASMA ETCHING; SILICA;

MONOTONOUS; OES; VOLUME KINETICS;

THIN FILMS;

EID: 33645240304     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.08.232     Document Type: Conference Paper

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