Effect of end groups on contact resistance of alkanethiol based metal-molecule-metal junctions using current sensing AFM

Applied Surface Science

Volumn 252, Issue 11, 2006, Pages 3956-3960

  Gosvami, N ^a   Lau, K H A ^b   Sinha, S K ^a   O'Shea, S J ^b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

Author keywords

Current sensing atomic force microscopy; Metal molecule metal junctions; Self assembled monolayer

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRONIC EQUIPMENT; SELF ASSEMBLY; SULFUR COMPOUNDS;

CONTACT RESISTANCES; CURRENT SENSING ATOMIC FORCE MICROSCOPY; METAL-MOLECULE-METAL JUNCTIONS;

SEMICONDUCTOR JUNCTIONS;

EID: 33645216721     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.09.050     Document Type: Conference Paper

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