SCOPUS 정보 검색 플랫폼

Volumn , Issue , 2006, Pages 193-198

Study of Pt addition to solve NiSi integration issues on CMOS devices

(7) Chiang, Yi Ying a Chang, Yu Lan a Hung, Tzung Yu a Chen, Yi Wei a Shieh, Chao Ching a Huang, Chien Chung a Tzou, Shih Fang a

a UNITED MICROELECTRONICS CORPORATION (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; FABRICATION; NICKEL COMPOUNDS; NUCLEATION; OXIDATION RESISTANCE; PLATINUM; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION; ELECTRIC RESISTANCE; NICKEL ALLOYS; OXIDATION; THERMODYNAMIC STABILITY; X RAY DIFFRACTION ANALYSIS;

CMOS FABRICATION; CONTACT RESISTANCE; DEFECT FORMATION; SHEET RESISTANCE; CMOS DEVICES; XRD PATTERN ANALYSIS;

ADDITION REACTIONS; PLATINUM;

EID: 33644963195 PISSN: 15401766 EISSN: None Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper

Times cited : (11)

References (11)

2
- 0033711826
- Q. Xiang, C. Woo, E. Paton, J. Foster, B. Yu, and M.R. Lin, Symp. on VLSI Tech., 76 (2000)
- (2000) Symp. on VLSI Tech. , pp. 76
- Xiang, Q.¹ Woo, C.² Paton, E.³ Foster, J.⁴ Yu, B.⁵ Lin, M.R.⁶

3
- 0036923306
- M. C. Öztürk, J. Liu, H. Mo, and N. Pesovic, IEDM Tech. Dig., 375 (2002)
- (2002) IEDM Tech. Dig. , pp. 375
- Öztürk, M.C.¹ Liu, J.² Mo, H.³ Pesovic, N.⁴

4
- 33644956828
- May 9-13
- J.P. Lu, D.S. Miles, A. Li-Fatou, Y.O. Xu, J. Zhao, A. Gurba, A.J. Griffin Jr., B. Hornug, M. Hewson, T. Grider, D. Mercer and C. Montgomery, Proc. of Advanced Short-Time Thermal Processing for Si-based CMOS Devices II, May 9-13 (2004), 159
- (2004) Proc. of Advanced Short-time Thermal Processing for Si-based CMOS Devices II , pp. 159
- Lu, J.P.¹ Miles, D.S.² Li-Fatou, A.³ Xu, Y.O.⁴ Zhao, J.⁵ Gurba, A.⁶ Griffin Jr., A.J.⁷ Hornug, B.⁸ Hewson, M.⁹ Grider, T.¹⁰ Mercer, D.¹¹ Montgomery, C.¹²

5
- 0030214332
- J.Y. Yew, L.J. Chen, and K. Nakamura, Appli. Phys. Lett., 69, 999 (1996)
- (1996) Appli. Phys. Lett. , vol.69 , pp. 999
- Yew, J.Y.¹ Chen, L.J.² Nakamura, K.³

6
- 21644467234
- M. Tsuchiaki, K. Ohuchi, and A. Nishiyama, IEDM Tech. Dig., 1059 (2004)
- (2004) IEDM Tech. Dig. , pp. 1059
- Tsuchiaki, M.¹ Ohuchi, K.² Nishiyama, A.³

7
- 3543079940
- Mar. 15-16
- th Fourth International Workshop on Junction Technology (IWJT), Mar. 15-16 (2004), 113
- (2004) th Fourth International Workshop on Junction Technology (IWJT) , pp. 113
- Chi, D.Z.¹ Lee, R.T.² Chua, S.J.³

8
- 4344691172
- K.L. Pey, P.S. Lee, and D. Mangelinck, Thin Solid Films, 462-463, 137 (2004)
- (2004) Thin Solid Films , vol.462-463 , pp. 137
- Pey, K.L.¹ Lee, P.S.² Mangelinck, D.³

9
- 0036143063
- Y. Tian, Y.L. Jiang, Y. Chen, F. Lu, and B.Z. Li, Semicond. Sci. Technol., 17, 83 (2002)
- (2002) Semicond. Sci. Technol. , vol.17 , pp. 83
- Tian, Y.¹ Jiang, Y.L.² Chen, Y.³ Lu, F.⁴ Li, B.Z.⁵

10
- 10644282991
- A. Lauwers, J.A. Kittl, M.Van Dal, O. Chamirian, M.A. Pawlak, M. Potter, R. Lindsay, T. Raymakers, X. Pages, B. Mebarki, T. Mandrekar, and K. Maex, Mater. Sci. Eng., 114-115, 29 (2004)
- (2004) Mater. Sci. Eng. , vol.114-115 , pp. 29
- Lauwers, A.¹ Kittl, J.A.² Dal, M.V.³ Chamirian, O.⁴ Pawlak, M.A.⁵ Potter, M.⁶ Lindsay, R.⁷ Raymakers, T.⁸ Pages, X.⁹ Mebarki, B.¹⁰ Mandrekar, T.¹¹ Maex, K.¹²

11
- 33644951469
- Sep. 13-15 (in press)
- K. Wang, H. Liu, J.H. Yeh, and M.H. Tsai, Proc. of International Symposium on Semiconductor Manufacturing (ISSM), Sep. 13-15 (2005) (in press)
- (2005) Proc. of International Symposium on Semiconductor Manufacturing (ISSM)
- Wang, K.¹ Liu, H.² Yeh, J.H.³ Tsai, M.H.⁴

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.