The electrical and pH-sensitive characteristics of thermal Gd2 O3 Si O2-stacked oxide capacitors

Journal of the Electrochemical Society

Volumn 153, Issue 4, 2006, Pages

  Chang, Liann Be ^a   Ko, Hong Hsi ^b   Lee, Yu Lin ^a   Lai, Chao Sung ^a,c   Wang, Chih Yao ^a  

^a CHANG GUNG UNIVERSITY   (Taiwan)

^b NATIONAL DEFENSE UNIVERSITY   (Taiwan)

^c ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

GADOLINIUM COMPOUNDS; IONS; OXIDATION; PH EFFECTS; SEMICONDUCTOR DEVICES; THERMODYNAMIC STABILITY; TRANSMISSION ELECTRON MICROSCOPY;

BUFFER SOLUTIONS; FLATBAND VOLTAGES; OXIDE CAPACITORS; THERMAL OXIDATION;

OXIDE SUPERCONDUCTORS;

EID: 33644808998     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2171822     Document Type: Article

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