Reverse engineering source polarization error

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5992, Issue 2, 2005, Pages

  Bailey, George E ^a   Adam, Kostas ^a   Brist, Travis ^a   Toublan, Olivier ^a   Estroff, Andrew ^b  

^a MENTOR GRAPHICS CORPORATION   (United States)

^b IMEC   (Belgium)

Author keywords

High NA; Hyper NA; Illumination optimization; Immersion; OPC; Source polarization

Indexed keywords

ELECTROMAGNETIC WAVE DIFFRACTION; ERROR ANALYSIS; LITHOGRAPHY; OPTIMIZATION; REVERSE ENGINEERING;

ILLUMINATION OPTIMIZATION; IMMERSION; OPC; SOURCE POLARIZATION;

MASKS;

EID: 33644602765     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.632420     Document Type: Conference Paper

References (8)

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8. G. E. Bailey, K. Adam, "Polarization influences through the optical path," Proceedings of SPIE, vol. 5754, pp. 1102-1112, 2005.