Scatterometry based CD and profile metrology of MoSi/quartz structures

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5992, Issue 2, 2005, Pages

  Yedur, Sanjay ^a   Vuong, Vi ^a   Shivaprasad, Deepak ^b   Sarathy, T P ^b   Tabet, Milad ^b   Korlahalli, Rahul ^b   Hu, Jiangtao ^b  

^a Timbre Technologies Inc   (United States)

^b NANOMETRICS INC   (United States)

Author keywords

ODP; Optical CD; Scatterometry; Spectroscopic Ellipsometry

Indexed keywords

ODP; OPTICAL CD; SCATTEROMETRY; SPECTROSCOPIC ELLIPSOMETRY;

DIFFRACTION GRATINGS; ELLIPSOMETRY; GEOMETRY; MEASUREMENTS; PHASE SHIFT; REFLECTOMETERS;

MASKS;

EID: 33644601879     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.632304     Document Type: Conference Paper

References (7)

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