Logic gate scanner focus control in high-volume manufacturing using scatterometry

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5375, Issue PART 1, 2004, Pages 713-720

  Dare, Richard ^a   Swain, Bryan ^b   Laughery, Michael ^b  

^a AGERE SYSTEMS   (United States)

^b Timbre Technologies Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH-VOLUME MANUFACTURING; NIKON SCANNERS; OPTICAL DIGITAL PROFILOMETRY (ODP); SCATTEROMETRY;

CORRELATION METHODS; LOGIC GATES; MICROPROCESSOR CHIPS; OPTICAL SYSTEMS; PHOTORESISTS; PROCESS CONTROL; PROFILOMETRY; SCANNING ELECTRON MICROSCOPY;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 4344603145     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.533835     Document Type: Conference Paper

References (0)